A Combinatorial Study of Photoelectrochemical Properties of Fe‐W‐O Thin Films
A Combinatorial Study of Photoelectrochemical Properties of Fe‐W‐O Thin Films
复制标题
Fe-W-O薄膜光电化学性能的组合研究
DOI：
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发表时间：
2015
期刊：
影响因子：
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通讯作者：
W. Schuhmann
中科院分区：
文献类型：
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作者：
Kirill Sliozberg;D. Schäfer;R. Meyer;A. Ludwig;W. Schuhmann
在氩气/氧气气氛中，采用反应共溅射法制备了连续的Fe-W-O混合薄膜材料库。通过使用自动光学扫描液滴池筛选材料库的局部光电化学性质。局部扫描电子显微镜（SEM）和电子色散X射线光谱（EDX）测量的材料库进行相关的组成，形态和光电流。铁含量在Fe 32 W 68 Ox至Fe 81 W 19 Ox的范围内变化。一个强烈的依赖性的膜的形态和测量的光电流上的组合物观察到最大的光电流从测量区域含有55原子%的铁。 大部分光活性区域显示出具有高表面积的多孔结构。这些材料的带隙值通过光电流光谱法进行评估，并显示出带隙值随组合物的系统变化。
A continuous mixed Fe-W-O thin-films materials library was fabricated by means of reactive co-sputtering from elemental iron and tungsten targets in argon/oxygen. The materials library was screened for its local photoelectrochemical properties by using an automated optical scanning droplet cell. Local scanning electron microscopy (SEM) and electron-dispersive X-ray spectroscopy (EDX) measurements of the materials library were performed to correlate the composition, morphology, and photocurrents. The iron content was varied in the range from Fe32W68Ox to Fe81W19Ox. A strong dependence of the film morphology and the measured photocurrents on the composition was observed with a maximal photocurrent from a measurement area containing 55 at % iron. The most photoactive area showed a porous structure with a high surface area. The bandgap values of these materials were assessed by photocurrent spectroscopy and showed a systematic variation of the bandgap values with the composition.