Microstructures and Reaction Properties of Ti/Ni, Ti/Al and Ni/Al Multilayer Films

Microstructures and Reaction Properties of Ti/Ni, Ti/Al and Ni/Al Multilayer Films
复制标题

Ti/Ni、Ti/Al和Ni/Al多层膜的微观结构和反应性能

DOI:
10.4028/www.scientific.net/jnanor.54.22
复制
发表时间:
2018-01-01
影响因子:
1.7
通讯作者:
Hu, Anming
Hu, Anming
中科院分区:
材料科学4区
文献类型:
--
作者:
Ma, Ying;Li, Hong;Hu, Anming

文献摘要

被引文献

相似文献

反应性多层薄膜是一种定义明确的非均相纳米结构高能材料,它可以通过自我持续的反应释放化学能。由于在连接、点火器和高能量密度电源等多个领域的潜在应用,它们引起了人们的强烈兴趣。本文采用磁控溅射法制备了Ti/Ni、Ti/Al和Ni/Al多层膜。对这些独立薄膜的反应动力学、微观结构和相变化进行了比较研究。在慢热反应过程中,多层Ti/Ni纳米箔的反应产物由B2-TiNi奥氏体转变为TiNi3奥氏体,说明了反应过程中相变的演变过程。这些中间相也可以通过缓慢加热和淬火来识别。快速成像结果表明,沉积Ti/Ni膜、Ti/Al膜和Ni/Al膜的前速度分别为0.47m/s、0.8m/s和3m/s。差热分析结果表明,三种复合材料的释放热量分别为551.44 J/g、434.18 J/g和562.5 J/g。在此基础上计算了锡焊料层熔化的最小理论多层厚度,证明了利用沉积膜连接锡焊料层的应用潜力。
Reactive multilayer thin films are well-defined heterogeneous nanostructured energetic materials which can release chemical energy through a self-sustainable reaction. They have attracted intense interests due to potential applications in diverse fields such as joining, igniters, and high energy density power sources. In this paper, Ti/Ni, Ti/Al and Ni/Al multilayer films were prepared by magnetron sputtering. The reaction kinetics, microstructure and phase variation of these free-standing films are comparatively investigated. During slow heat reaction, the reaction products of reactive multilayer Ti/Ni nanofoils change from B2-TiNi austenite phase into TiNi3, illustrating an evolution of the phase transformation during reaction. These intermediate phases are also identified by slow heating and quenching. The fast speed imaging exhibits that the front speed is 0.47m/s, 0.8m/s and 3m/s respectively for as-deposited Ti/Ni, Ti/Al, and Ni/Al films. Differential thermal analysis yields that the corresponding releasing heat is 551.44 J/g, 434.18 J/g, and 562.5 J/g for these three composites. The theoretical minimum multilayer thickness for melting a tin solder layer has been calculated on the base of these characterizations, which proved the application potential of joining using the as-deposited film.