Influence of Low Molecular Weight PDMS Chains in PDMS-based Non-Photolithography
Influence of Low Molecular Weight PDMS Chains in PDMS-based Non-Photolithography
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DOI：
10.1557/proc-0921-t06-03
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发表时间：
2006
期刊：
影响因子：
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通讯作者：
Jinook Kim;C. H. Lee;Mikyung Park;G. Chae;I. Chung
中科院分区：
文献类型：
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作者：
Jinook Kim;C. H. Lee;Mikyung Park;G. Chae;I. Chung
我们描述了一种弹性体印章的聚（二甲基硅氧烷）（PDMS）可以修改的表面能的一些表面时，共形接触的冲压数量。我们专注于增加的图案化表面的疏水性，由于低分子量（LMW）的有机硅聚合物链的扩散。在图案化过程中PDMS向表面的转移与在其中控制表面化学对于应用是重要的应用中使用该方法的那些人相关并引起他们的注意。
We describe that an elastomeric stamp of poly(dimethylsiloxane) (PDMS) can modify the surface energy of some surfaces when brought into conformal contact with the number of stamping. We focus on an increase of the hydrophobicity of the patterned surface due to diffusion of low molecular weight (LMW) silicone polymer chains. The transfer of PDMS to the surface during patterning is relevant to and calls for attention by those who are using this method in applications where control of the surface chemistry is of importance for the application.