Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge
Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge
复制标题
磁控溅射放电中溅射原子和反射原子热化的蒙特卡罗模拟
DOI：
10.1116/1.579874
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发表时间：
1995
期刊：
影响因子：
--
通讯作者：
M. Ishida
中科院分区：
文献类型：
--
作者：
Y. Yamamura;M. Ishida
为了模拟平面磁控溅射放电的整个系统，开发了Monte Carlo模拟程序acat−gas。阴极中的原子碰撞导致溅射和反射，通过acat−gas程序的acat例程来模拟;在平面溅射放电中背景气体中发射原子的热化通过Monte Carlo技术来模拟，其中使用M-Fermi-莫尔斯势来描述发射原子和背景气体原子之间的碰撞。模拟得到的溅射原子在阴极和衬底中点处的平均能量与实验结果吻合较好。结果表明，溅射原子和反射原子的速度分布、溅射原子和反射原子的透射率、背景气体中的平均能量以及反射原子到达基片的归一化能量等物理量都强烈地依赖于放电电压。
The Monte Carlo simulation code acat−gas has been developed in order to simulate the whole system of a planar magnetron sputtering discharge. The atomic collisions in the cathode, which lead to sputtering and reflection, are simulated by the acat routine of the acat−gas code; the thermalization of emitted atoms in the background gas within the a planar sputtering discharge is simulated by the Monte Carlo technique, where the Thomas–Fermi–Morse potential is used to describe collisions between ejected atoms and background gas atoms. The simulated average energy of sputtered atoms at the midpoint between the cathode and the substrate is in good agreement with experimental results. It is found that various physical quantities such as the velocity distributions of sputtered atoms and reflected atoms, the transmission rate of sputtered atoms and reflected atoms, the average energies in the background gas, and the normalized energy of arriving reflected atoms at the substrate depends strongly on the discharge vo...