Dynamic reaction cell inductively coupled plasma mass spectrometry for determination of silicon in steel

Dynamic reaction cell inductively coupled plasma mass spectrometry for determination of silicon in steel
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动态反应池电感耦合等离子体质谱法测定钢中的硅

DOI:
10.1016/s0584-8547(02)00214-8
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发表时间:
2003
期刊:
Spectrochimica Acta Part B: Atomic Spectroscopy
影响因子:
--
通讯作者:
Shiuh
Shiuh
中科院分区:
--
文献类型:
--
作者:
Hui;Shiuh

文献摘要

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使用配备动态反应池™ (DRC) 的电感耦合等离子体四极杆质谱仪 (ICP-QMS) 测定钢样品中的硅。研究了DRC系统工作条件的影响,以获得28Si的最佳信噪比。通过在 DRC 中使用 NH3 作为反应池气体,硅质量 m/z 28 处的潜在干扰离子 12C16O+ 和 14N14N+ 的强度显着降低。通过使用 DRC 系统,信号背景比提高了一个数量级以上。通过测定钢标准参考材料(NIST SRM 15h 和 SRM 368)中的硅来验证该方法。认证值和实验结果之间取得了良好的一致性。所有测定的准确度均优于 3%。硅的检测限在 0.2 ng ml−1 范围内,相当于原始样品中的 2 μg g−1。所有测定的样品重复之间的精密度 (R.S.D.) 均优于 5%。
An inductively coupled plasma quadrupole mass spectrometer (ICP-QMS) equipped with a dynamic reaction cell™ (DRC) was used for the determination of silicon in steel samples. The effect of the operating conditions of the DRC system was studied to get the best signal-to-noise ratio for28Si. The intensity of potentially interfering ions12C16O+and14N14N+at the silicon mass m/z 28 were reduced significantly by using NH3as the reaction cell gas in the DRC. The signal-to-background ratio was improved more than one order by using the DRC system. Validation of the method was carried out by the determination of silicon in steel standard reference materials (NIST SRM 15h and SRM 368). Good agreement was obtained between the certified values and the experimental results. The accuracy was better than 3% for all the determinations. The detection limit for silicon was in the range of 0.2 ng ml−1which corresponds to 2 μg g−1in the original sample. The precision (R.S.D.) between sample replicates was better than 5% for all the determinations.