Lifshitz interaction can promote ice growth at water-silica interfaces
Lifshitz interaction can promote ice growth at water-silica interfaces
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Lifshitz 相互作用可以促进水-二氧化硅界面处的冰生长
DOI：
10.1103/physrevb.95.155422
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发表时间：
2017
影响因子：
3.7
通讯作者：
I. Brevik
中科院分区：
文献类型：
--
作者：
M. Bostrom;O. Malyi;Prachi Parashar;K. V. Shajesh;P. Thiyam;K. Milton;C. Persson;D. Parsons;I. Brevik
在空气-水界面，Lifshitz相互作用本身并不促进冰的生长。相反，我们发现，Lifshitz力促进了冰膜的生长，厚度可达1-8 nm，在水的三相点附近的硅-水界面。这是在一个系统中实现的，在该系统中，延迟和零频率模式的组合效应影响低温下的短程相互作用，这与通常的理解相反。在具有高孔隙度的二氧化硅中，Lifshitz光谱函数中的正贡献和负贡献之间的抵消是反向的。我们的研究结果为水如何在玻璃和其他表面上冻结提供了一个模型。
At air-water interfaces, the Lifshitz interaction by itself does not promote ice growth. On the contrary, we find that the Lifshitz force promotes the growth of an ice film, up to 1–8 nm thickness, near silica-water interfaces at the triple point of water. This is achieved in a system where the combined effect of the retardation and the zero frequency mode influences the short-range interactions at low temperatures, contrary to common understanding. Cancellation between the positive and negative contributions in the Lifshitz spectral function is reversed in silica with high porosity. Our results provide a model for how water freezes on glass and other surfaces.