Chemical and Ionic Conductivity Degradation of Ultra-Thin Ionomer Film by X-ray Beam Exposure
Chemical and Ionic Conductivity Degradation of Ultra-Thin Ionomer Film by X-ray Beam Exposure
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X 射线束曝光导致超薄离聚物薄膜的化学和离子电导率降低
DOI：
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发表时间：
2013
期刊：
影响因子：
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通讯作者：
K. Karan
中科院分区：
文献类型：
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作者：
Devproshad K. Paul;J. B. Giorgi;K. Karan
在质子交换膜燃料电池中，基于X射线的技术已经被用作非原位和原位材料表征技术的诊断工具。X射线照射可能对NafiON造成的损伤是一个令人担忧的问题，尤其是对于薄的fiLMS。为了研究X射线辐照超薄Nafi对film结构和性能的影响，在SiO上制备了负载型10 nmfilms
X-ray based techniques have been adopted as a diagnostic tool for both ex-situ and in-situ material characterization techniquesin PEMFC. Possible damage of Nafion due to X-ray irradiation is a concern especially for thin films. To investigate the X-rayirradiation effect on ultra-thin Nafion film structure and properties, supported 10 nm films were prepared on SiO