High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography
High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography
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DOI：
10.1063/1.4774298
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发表时间：
2013-01-07
影响因子：
4
通讯作者：
Starikov, S. D.
中科院分区：
文献类型：
--
作者：
Chkhalo, N. I.;Kuenstner, S.;Starikov, S. D.
报道了La/B_4C多层膜的优化和制备结果。这样的反射镜是有前途的光学元件的发展，下一代的纳米光刻在6.7 nm的工作波长。在BESSY-II软X射线反射计光束线上测得了高达58.6%的近正入射反射率。这是迄今为止在该波长下测得的最高反射率。进一步提高多层膜的反射率的潜力进行了讨论。(C)2013年美国物理学会。[http：//dx.doi.org/10.1063/1.4774298]
Results on optimization and manufacturing of La/B4C multilayers are reported. Such mirrors are promising optical elements for the development of the next generation of nano-lithography at an operation wavelength of 6.7 nm. A near-normal incidence reflectivity of up to 58.6% has been measured at the BESSY-II soft x-ray reflectometer beamline. This is the highest reflectivity measured so far at this wavelength. The potential to further increase the reflectivity of the multilayers is discussed. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4774298]