Structure and mechanical properties of Cr–B–N films deposited by reactive magnetron sputtering
Structure and mechanical properties of Cr–B–N films deposited by reactive magnetron sputtering
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DOI：
10.1016/j.jallcom.2009.07.060
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发表时间：
2009-11
影响因子：
6.2
通讯作者：
Guangan Zhang;Liping Wang;P. Yan;Q. Xue
中科院分区：
文献类型：
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作者：
Guangan Zhang;Liping Wang;P. Yan;Q. Xue
采用反应磁控溅射方法，在反应气体存在下，用Cr和B共沉积靶制备了不同B含量的Cr-B-N薄膜。对比研究了不同B含量的CrN和Cr-B-N薄膜的显微结构和力学性能。B的加入降低了CrBN薄膜的晶化程度，而B在CrBN薄膜中主要以BN化合物的非晶相存在。力学性能也得到改善。Cr-B-N薄膜的质量分数为6.1at.% B含量最高的硬度和最低的磨损率。
Cr–B–N films with various B contents were deposited by reactive magnetron sputtering from the co-deposition of Cr and B targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and Cr–B–N films with various B contents were conducted. The addition of B to CrN films caused a decrease of the crystallization of the films, while the B existed mainly as amorphous phase of BN compound in the CrBN films. The mechanical properties were also improved. And the Cr–B–N films with 6.1at.% B content showed highest hardness and lowest wear rate.