Electrochemical micromachining of micro-dimple arrays using a polydimethylsiloxane (PDMS) mask
Electrochemical micromachining of micro-dimple arrays using a polydimethylsiloxane (PDMS) mask
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DOI：
10.1016/j.jmatprotec.2015.09.008
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发表时间：
2016-03-01
影响因子：
6.3
通讯作者：
Xu, Zhengyang
中科院分区：
文献类型：
--
作者：
Chen, Xiaolei;Qu, Ningsong;Xu, Zhengyang
工程零件表面的微凹坑阵列对零件的性能起着重要的作用。掩模电化学微加工是一种制备尺寸、位置和密度可控的微凹坑阵列的常用方法。然而，在传统的TMEMM中，电化学加工之前必须进行光刻，这在大规模生产中是耗时且昂贵的。在本文中，聚二甲基硅氧烷（PDMS）掩模用于TMEMM产生高质量的微凹坑阵列。与光刻相比，这具有PDMS掩模可以重复使用并且具有微尺度图案的优点。因此，这种技术可以取代光刻在应用TMEMM产生微凹坑阵列。采用PDMS掩模制作微坑阵列，研究了三种电解液流动模式，提出了一种改进的多狭缝阴极正向模式，用于制作尺寸和分布均匀的微坑阵列。使用这种方法，产生的阵列具有106 μ m直径和10 μ m深度的平均微凹坑尺寸，具有低标准偏差（STDEV）。此外，研究结果表明，直流和脉冲电流都可以用来产生具有高度的本地化的微凹坑阵列，虽然脉冲电流产生更深的微凹坑。(C)2015 Elsevier B.V.版权所有。
Micro-dimple arrays on the surfaces of engineering parts play an important role in the behaviour of these parts. Through-mask electrochemical micromachining (TMEMM) is a popular method for generating micro-dimple arrays with controlled size, location and density. However, in conventional TMEMM, the electrochemical machining must be preceded by photolithography, which is time-consuming and expensive in mass production. In this paper, a polydimethylsiloxane (PDMS) mask is used in TMEMM for generating high-quality micro-dimple arrays. Compared with photolithography, this has the advantage that the PDMS mask can be re-used and has a micro-scale pattern. This technique could therefore replace photolithography in the application of TMEMM to generate micro-dimple arrays. With a PDMS mask being used for generating micro-dimple arrays, three electrolyte flow modes are investigated, and a modified forward mode with a multi-slit structured cathode is proposed for the generation of arrays that have uniform micro-dimple distributions and dimensions. Using this method, arrays are generated with average micro-dimple dimensions of 106 mu m diameter and 10 mu m depth, with a low standard deviation (STDEV). In addition, the results show that both direct current and pulsed current can be used to generate micro-dimple arrays with a high degree of localization, although pulsed current produces deeper micro-dimples. (C) 2015 Elsevier B.V. All rights reserved.