Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering
Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering
复制标题
磁控溅射制备高熵非晶NbTiAlSiWxNy薄膜的纳米晶化
DOI：
10.3390/e18060226
复制
发表时间：
2016-06-01
期刊：
影响因子：
2.7
通讯作者：
Zhang, Yong
中科院分区：
文献类型：
--
作者：
Sheng, Wenjie;Yang, Xiao;Zhang, Yong
在N_2+Ar(N_2+Ar=24标准立方厘米/分钟，N_2=0，4，8立方厘米/分钟)的混合气氛中，用磁控溅射方法制备了高熵非晶NbTiAlSiWxNy薄膜(x=0或1，即NbTiAlSiNy和NbTiAlSiWNy)。经1000℃热处理后，薄膜开始晶化，NbTiAlSiNy薄膜(N_2=4，8sccm)具有面心立方(Fcc)结构，NbTiAlSiW金属膜具有体心立方(Bcc)结构，然后随着氮气流量的增加转变为由纳米颗粒组成的fcc结构。NbTiAlSiNy薄膜的硬度和模数分别达到最大值20.5 GPa和206.8 GPa.对于沉积的NbTiAlSiWNy薄膜，随着氮气流量的增加，弹性模量和硬度分别增加到最大值13.6 GPa和154.4 GPa后下降。这两种薄膜都有可能成为高温防护涂层的候选材料。
High-entropy amorphous NbTiAlSiWxNy films (x = 0 or 1, i.e., NbTiAlSiNy and NbTiAlSiWNy) were prepared by magnetron sputtering method in the atmosphere of a mixture of N2 + Ar (N2 + Ar = 24 standard cubic centimeter per minute (sccm)), where N2 = 0, 4, and 8 sccm). All the as-deposited films present amorphous structures, which remain stable at 700 °C for over 24 h. After heat treatment at 1000 °C the films began to crystalize, and while the NbTiAlSiNy films (N2 = 4, 8 sccm) exhibit a face-centered cubic (FCC) structure, the NbTiAlSiW metallic films show a body-centered cubic (BCC) structure and then transit into a FCC structure composed of nanoscaled particles with increasing nitrogen flow rate. The hardness and modulus of the as-deposited NbTiAlSiNy films reach maximum values of 20.5 GPa and 206.8 GPa, respectively. For the as-deposited NbTiAlSiWNy films, both modulus and hardness increased to maximum values of 13.6 GPa and 154.4 GPa, respectively, and then decrease as the N2 flow rate is increased. Both films could be potential candidates for protective coatings at high temperature.