Molecular beam epitaxy : from research to mass production
Molecular beam epitaxy : from research to mass production
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发表时间：
2013
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通讯作者：
M. Henini
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作者：
M. Henini
这本多贡献者手册讨论了分子束外延（MBE），一种外延沉积技术，涉及在衬底上沉积原子厚度的材料层。它总结了分子束外延的研究和应用在外延生长与密切的讨论和“如何”处理分子或原子束发生在一个表面上的加热晶体衬底在真空中。在过去的三十年里，MBE的重要性已经从纯研究领域扩展到商业应用（原型器件结构和更多的高级研究阶段）（就独特的作者，论文和会议而言）。分子束外延是重要的，因为它能够实现新的器件现象，并有助于生产具有极精细尺寸和成分控制的多层结构。这些技术可以部署在任何需要具有增强和独特性能的精密薄膜器件的地方，用于计算，光学或光子学。这本书涵盖了MBE在电子和光电器件的研究和大规模生产方面所取得的进展。它包括新的半导体材料，商业上可用的新器件结构，以及更多处于高级研究阶段的产品。本标题：将分子束外延的基础科学浓缩成现代参考文献，加速文献综述;讨论新材料，新应用和新器件结构，将当前的商业应用与工业和研究的现代理解结合起来;并将分子束外延作为大规模生产外延技术的特点，提高半导体工业和纳米结构半导体材料研究社区的加工效率和产量。
This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a 'how to' on processing molecular or atomic beams that occur on a surface of a heated crystalline substrate in a vacuum. MBE has expanded in importance over the past thirty years (in terms of unique authors, papers and conferences) from a pure research domain into commercial applications (prototype device structures and more at the advanced research stage). MBE is important because it enables new device phenomena and facilitates the production of multiple layered structures with extremely fine dimensional and compositional control. The techniques can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. This book covers the advances made by MBE both in research and mass production of electronic and optoelectronic devices. It includes new semiconductor materials, new device structures which are commercially available, and many more which are at the advanced research stage. This title: condenses fundamental science of MBE into a modern reference, speeding up literature review; discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research; and, features coverage of MBE as mass production epitaxial technology, enhances processing efficiency and throughput for semiconductor industry and nanostructured semiconductor materials research community.