Si/B/C/N/Al precursor-derived ceramics: Synthesis, high temperature behaviour and oxidation resistance

Si/B/C/N/Al precursor-derived ceramics: Synthesis, high temperature behaviour and oxidation resistance
复制标题

DOI:
10.1016/j.jeurceramsoc.2003.10.018
复制
发表时间:
2004
影响因子:
5.7
通讯作者:
A. Müller;P. Gerstel;E. Butchereit;K. Nickel;F. Aldinger
A. Müller;P. Gerstel;E. Butchereit;K. Nickel;F. Aldinger
中科院分区:
材料科学1区
文献类型:
--
作者:
A. Müller;P. Gerstel;E. Butchereit;K. Nickel;F. Aldinger

文献摘要

被引文献

相似文献

将Si/B/C/N/H聚合物T2(1)[B(C2 H4 Si(CH 3)NH)3]n与不同量的H3 Al·NMe 3反应,制备了三种Si/B/C/N/Al陶瓷的有机金属前驱体。在1400 °C下通过热处理将这些前驱体转化为陶瓷材料。陶瓷产率从贫Al聚合物(3.6重量%)的63%变化至20%。Al)至71%的富Al前体(9.2wt. Al)。烧结态陶瓷中含有纳米SiC晶体。在1800 °C下的热处理导致形成由结晶SiC、Si 3 N4、AlN(+SiC)和BNCx相组成的显微结构。在2000 °C下,含氮相(部分)在氮气或氩气气氛中分解。高温稳定性与样品中的铝浓度没有明确的相关性。在1100、1300和1500 °C下分析氧化行为。与无Al的Si(/B)/C/N陶瓷相比,铝的添加显著改善了氧化皮质量,包括粘附性、开裂和气泡形成。Si/B/C/N/Al陶瓷在1500 °C下的氧化皮生长速率与CVD-SiC和CVD-Si 3 N4相当,这使得这些材料有希望成为氧化环境中高温应用的候选材料。
The Si/B/C/N/H polymer T2(1), [B(C2H4Si(CH3)NH)3]n, was reacted with different amounts of H3Al·NMe3to produce three organometallic precursors for Si/B/C/N/Al ceramics. These precursors were transformed into ceramic materials by thermolysis at 1400 °C. The ceramic yield varied from 63% for the Al-poor polymer (3.6 wt.% Al) to 71% for the Al-rich precursor (9.2 wt.% Al). The as-thermolysed ceramics contained nano-sized SiC crystals. Heat treatment at 1800 °C led to the formation of a microstructure composed of crystalline SiC, Si3N4, AlN(+SiC) and a BNCxphase. At 2000 °C, nitrogen-containing phases (partly) decomposed in a nitrogen or argon atmosphere. The high temperature stability was not clearly related to the aluminium concentration within the samples. The oxidation behaviour was analysed at 1100, 1300, and 1500 °C. The addition of aluminium significantly improved the oxide scale quality with respect to adhesion, cracking and bubble formation compared to Al-free Si(/B)/C/N ceramics. Scale growth rates on Si/B/C/N/Al ceramics at 1500 °C were comparable with CVD–SiC and CVD–Si3N4, which makes these materials promising candidates for high-temperature applications in oxidizing environments.