Nanofabrication of Multilayer Zone Plates by Helicon Plasma Sputtering
Nanofabrication of Multilayer Zone Plates by Helicon Plasma Sputtering
复制标题
螺旋等离子体溅射多层波带片的纳米加工
DOI：
10.1143/jjap.34.6754
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发表时间：
1995
影响因子：
1.5
通讯作者：
Isao H. Suzuki Isao H. Suzuki
中科院分区：
文献类型：
--
作者：
M. Koike;Isao H. Suzuki Isao H. Suzuki
已经制造了最外区宽度小于100 nm的多层波带片。采用螺旋等离子体溅射技术交替沉积Ag和Al层，其中Ar气体压力小于1×10-3 Torr，这比常规磁控溅射低一个数量级。沉积了100多层Ag/Al层，每层的厚度由计算机监测和控制。多层平面垂直切片，并在沉积后减薄。与晶体结合的多层波带片用作硬X射线的单色化和聚焦装置，即，布拉格-菲涅耳透镜。
Multilayer zone plates whose outermost zone widths are less than 100 nm have been fabricated. Alternate deposition of Ag and Al layers has been performed using a helicon plasma sputtering technique, in which Ar gas pressure was less than 1×10-3 Torr, which is one order lower than in conventional magnetron sputtering. More than 100 Ag/Al layers were deposited, with the thickness of each layer being monitored and controlled by a computer. The multilayered plane was sliced vertically and thinned after the deposition. The multilayer zone plate combined with a crystal acts as a monochromatizing and focusing device for hard X-rays, i.e., a Bragg-Fresnel lens.