Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4/Ar mixture
Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4/Ar mixture
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DOI：
10.1016/j.surfcoat.2011.03.120
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发表时间：
2011-06
影响因子：
5.4
通讯作者：
Yongxia Wang;Yinping Ye;Hongxuan Li;L. Ji;Yongjun Wang;Xiaohong Liu;Jianmin Chen;Hui-di Zhou
中科院分区：
文献类型：
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作者：
Yongxia Wang;Yinping Ye;Hongxuan Li;L. Ji;Yongjun Wang;Xiaohong Liu;Jianmin Chen;Hui-di Zhou
在不同的CH4/Ar比下，采用非平衡磁控溅射技术在钢片和硅片上制备了氢化非晶碳（a-C:H）薄膜。采用傅里叶变换红外光谱（FTIR）、拉曼光谱（Raman）、原子力显微镜（AFM）和衬底曲率法研究了a-C:H薄膜的微观结构和性能。结果表明，CH4/Ar比对H含量有重要影响，而对sp3/sp2比的影响较小。薄膜内应力较低（< 1 GPa），沉积速率随ch4分数的降低先减小后增大。在CH4/Ar = 1/1 （55 sccm/55 sccm）条件下，sp3C-H / sp3C-C适中，膜的摩擦学性能最好。a-C:H薄膜的组成、微观结构和性能与沉积工艺和反应物气体的组成密切相关。
Hydrogenated amorphous carbon (a-C:H) films were deposited on steel and silicon wafers by unbalanced magnetron sputtering under different CH4/Ar ratios. Microstructure and properties of the a-C:H films were investigated via Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Atomic force microscopy (AFM) and substrate curvature method. The results revealed that CH4/Ar ratio played an important role in the H content but acted a little function on the sp3/sp2ratio of the films. Also, the internal stress of those films was relatively low (< 1 GPa), and the deposition rate decreased firstly and then increased with the decrease of the CH4fraction. The film deposited under CH4/Ar = 1/1 (55 sccm/55 sccm) with moderate sp3C–H / sp3C–C had the best tribological properties. The composition, microstructure and properties of the a-C:H films were strongly dependent on the deposition process and composition of reactant gases.