Formation of hill and valley structures on Si(001) vicinal surfaces studied by spot-profile-analyzing LEED
Formation of hill and valley structures on Si(001) vicinal surfaces studied by spot-profile-analyzing LEED
复制标题
通过点轮廓分析 LEED 研究 Si(001) 邻面上山丘和山谷结构的形成
DOI:
--
复制
发表时间:
2000
期刊:
影响因子:
--
通讯作者:
M. H. Hoegen
中科院分区:
文献类型:
--
作者:
H. Minoda;T. Shimakura;K. Yagi;F. M. Z. Heringdorf;M. H. Hoegen
Formation of ‘‘hill-and-valley’’ structures on Si~001! vicinal surfaces induced by Au adsorption which accompanies formation of the Si~001!533.2-Au reconstruction, was studied by in situ high-resolution lowenergy electron diffraction. The ‘‘hill-and-valley’’ structures are composed of ~001! terraces and ~119! facets under the equilibrium condition independent of the miscut angle ~0.5–8°! of the substrate surfaces. This does not depend on sample treatments and the similar structures are obtained by annealing after Au deposition at room temperature as well as Au deposition at high temperature. In situ observation during annealing indicates that commensurate fivefold structures such as 533 and A2633 that were previously observed are not formed on the Si~001! surface and only the 533.2 structure is formed in this system. Double domain structures initially formed in such a way that the 533.2 and 3.235 domains are formed on the 231 and 132 terraces, respectively, finally transforms into single domain 533.2 structure where the fivefold direction is parallel to the miscut direction.