Influence of base additives on the reaction diffusion front of model chemically amplified photoresists
Influence of base additives on the reaction diffusion front of model chemically amplified photoresists
复制标题
碱添加剂对模型化学放大光刻胶反应扩散前沿的影响
DOI：
10.1116/1.2429675
复制
发表时间：
2007
影响因子：
1.4
通讯作者：
Karen L. Turnquest
中科院分区：
文献类型：
--
作者：
B. Vogt;Shuhui Kang;V. Prabhu;Ashwin Rao;E. Lin;Wen;S. Satija;Karen L. Turnquest
采用中子反射率和傅里叶变换红外光谱相结合的方法，测量了胺基猝灭剂对模型光致抗蚀剂光酸催化脱保护反应扩散前沿的影响。碱相对于光酸扩散催化剂位置的调制改变了空间反应程度，并阐明了碱对反应扩散前沿形状的复杂作用。尽管反应的总程度相似，但均匀碱和模型光降解碱分布的比较表明，反应时间和碱浓度对脱保护剖面形状的影响明显。这些差异是由于光酸的中和作用和光刻胶成分变化对反应扩散过程的影响导致初始脱保护程度的改变。由于这些影响，使用可光降解的模型基底会产生更锐利的正面。最后，在氢氧化物中这些l…
The effects of amine base quencher on the photoacid catalyzed deprotection reaction-diffusion front in model photoresists were measured by combination of neutron reflectivity and Fourier transform infrared spectroscopy. Modulation in the location of the base with respect to the diffusing photoacid catalyst changes the spatial reaction extent and illuminates the complex role of the base on the shape of the reaction-diffusion front. Despite similar total extents of reaction, a comparison between uniform base and model photodegradable base distributions demonstrates distinct reaction time and base concentration effects on the deprotection profile shape. These differences arise from the modification of the initial deprotection extent due to both the neutralization of the photoacid and the influence of the changing photoresist composition on the reaction-diffusion process. The use of the model photodegradable base results in a sharper front due to these effects. Lastly, aqueous hydroxide development of these l...