Growth of Epitaxial Co/Cu Superlattices with Surface Orientations of (111), (100) and (110) by DC Magnetron Sputtering
Growth of Epitaxial Co/Cu Superlattices with Surface Orientations of (111), (100) and (110) by DC Magnetron Sputtering
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直流磁控溅射表面取向为(111)、(100)和(110)的外延Co/Cu超晶格生长
DOI：
10.1143/jjap.33.2041
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发表时间：
1994
期刊：
影响因子：
--
通讯作者：
F. Yoshizaki
中科院分区：
文献类型：
--
作者：
T. Kingetsu;F. Yoshizaki
采用直流磁控溅射沉积技术，在超高真空的基底压力下成功地生长出了具有（111）、（100）和（110）三个主要表面取向的Co/Cu外延超晶格。x射线衍射谱表明，即使在相同条件下制备的（111）、（100）和（110）取向超晶格中，Co和Cu层之间的界面结构也不同。
Epitaxial Co/Cu superlattices with three major surface orientations of (111), (100) and (110) were successfully grown by dc magnetron sputter deposition with a base pressure of an ultrahigh vacuum. X-ray diffraction profiles suggested that the structures of the interfaces between Co and Cu layers were different among the (111)-, (100)- and (110)-oriented superlattices even when prepared under the same conditions.