Effects of surface structures of MgO(100) single crystal substrates on ferroelectric PbTiO3 thin films grown by radio frequency sputtering

Effects of surface structures of MgO(100) single crystal substrates on ferroelectric PbTiO3 thin films grown by radio frequency sputtering
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MgO(100)单晶衬底表面结构对射频溅射铁电PbTiO3薄膜的影响

DOI:
10.1116/1.579392
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发表时间:
1995
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
通讯作者:
S. Baik
S. Baik
中科院分区:
--
文献类型:
--
作者:
Sang;S. Baik

文献摘要

被引文献

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研究了MgO(100)单晶基片表面结构对射频磁控溅射法生长PbTiO 3薄膜的影响。首先,使用卢瑟福背散射光谱结合沟道,表面敏感X射线散射和原子力显微镜来表征通过切割,抛光和退火制备的衬底的表面结构。我们发现薄膜的表面结构和生长之间有很强的相关性。解理衬底上的膜是不均匀的,其结晶度是较差的,比抛光或退火衬底上由于存在大的解理步骤,而更好的外延发现退火衬底上比抛光衬底上。抛光后的热退火的有利效果已被解释的基础上,表面台阶重排,去除损伤,并通过热退火处理的表面平整度的改善。
Effects of surface structures of MgO(100) single crystal substrates on the growth of PbTiO3 thin films by radio frequency magnetron sputtering have been investigated. First, the surface structures of the substrates prepared by cleaving, polishing, and annealing were characterized using Rutherford backscattering spectroscopy combined with channeling, surface sensitive x‐ray scattering, and atomic force microscopy. We found a strong correlation between the surface structures and the growth of the thin films. The film on the cleaved substrate was not uniform and its crystallinity was poorer than that on the polished or the annealed substrates due to the presence of large cleavage steps, whereas better epitaxiality was found on the annealed substrate than on the polished substrate. Favorable effects of thermal annealing after polishing have been explained based on surface step rearrangements, damage removal, and improvement in surface flatness by the thermal annealing treatment.