An atmospheric-pressure plasma brush driven by sub-microsecond voltage pulses
An atmospheric-pressure plasma brush driven by sub-microsecond voltage pulses
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DOI：
10.1088/0963-0252/20/6/065009
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发表时间：
2011-12-01
影响因子：
3.8
通讯作者：
Pan, Y.
中科院分区：
文献类型：
--
作者：
Lu, X.;Wu, S.;Pan, Y.
本文报道了一种大气压室温等离子体刷，它可以提供均匀的表面处理效果。等离子体的结构，其中包括负辉光，法拉第暗区和正柱，是清晰可见的肉眼。法拉第暗区的宽度随着间隙距离的减小而减小，这一现象与从低压辉光放电等离子体中观察到的现象不同。在曝光时间为2.5 ns时拍摄的高速照片显示，对于6 mm和2 mm的间隙距离，等离子体从喷嘴传播到物体分别在约100 ns和10 ns内，并且结果与电测量一致。发射光谱显示除了O、N（2）（+）、N（2）（C-B）和He的发射带之外，还显示N（2）（B-A）的发射带，这表明等离子体源是反应性的，并且适合于诸如表面改性和材料处理的应用。
An atmospheric-pressure room-temperature plasma brush, which can deliver uniform surface treatment effects, is reported. The plasma structure, which includes the negative glow, Faraday dark space and positive column, is clearly visible to the naked eye. The width of the Faraday dark space diminishes with decreasing gap distance and this phenomenon is different from that observed from low-pressure glow discharge plasmas. High-speed photographs taken at an exposure time of 2.5 ns show that the plasma propagates from the nozzle to the object in about 100 ns and 10 ns for gap distances of 6 mm and 2 mm, respectively, and the results are consistent with electric measurements. The emission spectra reveal N(2)(B-A) bands in addition to those of O, N(2)(+), N(2)(C-B) and He, indicating that the plasma source is reactive and suitable for applications such as surface modification and materials processing.