Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering
Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering
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DOI：
10.1063/1.2822404
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发表时间：
2007-12-03
影响因子：
4
通讯作者：
Chen, N. F.
中科院分区：
文献类型：
--
作者：
You, J. B.;Zhang, X. W.;Chen, N. F.
在纯Ar气氛下，用溅射法在Ag/Si（001）衬底上制备了ZnO薄膜。当在ZnO薄膜和Si衬底之间引入100 nm的Ag中间层时，观察到ZnO紫外发射的显著增强和半峰全宽的减小。此外，还发现ZnO/Ag/Si样品完全抑制了与缺陷相关的可见光发射。这种改善的光学性能的ZnO是由于银表面等离子体激元和ZnO的紫外发射之间的共振耦合。(c)2007年，美国物理学会。
The ZnO films were grown on Ag/Si(001) substrates by sputtering Ag and ZnO targets successively in a pure Ar ambient. A significant enhancement of ZnO ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm Ag interlayer between ZnO film and Si substrate. Furthermore, a complete suppression of the defect related visible emission was also found for the ZnO/Ag/Si sample. This improved optical performance of ZnO is attributed to the resonant coupling between Ag surface plasmon and ultraviolet emission of ZnO. (c) 2007 American Institute of Physics.