Crystallization study of amorphous sputtered NiTi bi-layer thin film
Crystallization study of amorphous sputtered NiTi bi-layer thin film
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DOI：
10.1016/j.matchar.2015.03.017
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发表时间：
2015-05
影响因子：
4.7
通讯作者：
M. Mohri;M. Mohri;M. Nili-ahmadabadi;V. Chakravadhanula
中科院分区：
文献类型：
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作者：
M. Mohri;M. Mohri;M. Nili-ahmadabadi;V. Chakravadhanula
研究了磁控溅射法制备富镍/NiTiCu双层薄膜的结晶过程。为了达到形状记忆效果，将室温下沉积的非晶结构NiTi薄膜在773 K下退火15、30和60 min进行结晶。采用差示扫描量热法测定结晶温度，掠射x射线衍射法鉴定相结构，原子力显微镜评价表面形貌，扫描透射电子显微镜研究薄膜的截面。结果表明，退火薄膜的结构与退火温度和时间密切相关。晶粒首先在表面成核，然后向内生长形成柱状晶粒。此外，晶化行为受到组分变化的显著影响。
The crystallization of Ni-rich/NiTiCu bi-layer thin film deposited by magnetron sputtering from two separate alloy targets was investigated. To achieve the shape memory effect, the NiTi thin films deposited at room temperature with amorphous structure were annealed at 773 K for 15, 30, and 60 min for crystallization. Characterization of the films was carried out by differential scanning calorimetry to indicate the crystallization temperature, grazing incidence X-ray diffraction to identify the phase structures, atomic force microscopy to evaluate surface morphology, scanning transmission electron microscopy to study the cross section of the thin films. The results show that the structure of the annealed thin films strongly depends on the temperature and time of the annealing. Crystalline grains nucleated first at the surface and then grew inward to form columnar grains. Furthermore, the crystallization behavior was markedly affected by composition variations.