Microstructure, mechanical and electrochemical properties evaluation of pulsed DC reactive magnetron sputtered nanostructured Cr―Zr―N and Cr―Zr―Si―N thin films
Microstructure, mechanical and electrochemical properties evaluation of pulsed DC reactive magnetron sputtered nanostructured Cr―Zr―N and Cr―Zr―Si―N thin films
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DOI：
10.1016/j.surfcoat.2010.09.005
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发表时间：
2010-11
影响因子：
5.4
通讯作者：
Jyh-Wei Lee;S. Chang;Hsien-Wei Chen;Chien Chien-Chien;J. Duh;Chaur-Jeng Wang
中科院分区：
文献类型：
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作者：
Jyh-Wei Lee;S. Chang;Hsien-Wei Chen;Chien Chien-Chien;J. Duh;Chaur-Jeng Wang
采用双极不对称脉冲直流反应磁控溅射系统制备了不同Zr含量的Cr-Zr-Si-N薄膜。此外，还制备了不加硅的Cr-Zr-N薄膜作为参考。研究了添加不同元素Zr对Cr-Zr-Si-N薄膜的组成、微观结构、力学性能、摩擦学性能和电化学性能的影响。采用掠角X射线衍射仪(GA-X射线衍射仪)、扫描电子显微镜(SEM)和透射电子显微镜(TEM)对薄膜的微观结构进行了表征。采用纳米压痕仪、维氏显微硬度计和销盘磨损试验机分别测试了薄膜的硬度、韧性和摩擦学性能。在3.5wt.%的氯化钠水溶液中对薄膜的电化学性质进行了评价。对于Cr-Zr-Si-N薄膜，通过改变靶功率密度，Si含量固定在6-8at.%左右，不同的Zr含量在0.5-13.6at.%之间。与Cr-Zr-N基准膜相比，添加~7.0at.%的Si可以细化膜层的柱状结构，提高膜层的力学性能和耐蚀性能。随着Zr含量的增加，薄膜的晶格常数发生了膨胀。在Cr-13.6at.%Zr-6.8at.%Si-N薄膜的情况下，得到了晶粒尺寸在5-10 nm左右的纳米结构薄膜。总体而言，薄膜的硬度、塑性变形抗力和耐腐蚀性也随着薄膜中Zr含量的增加而增加。在本研究中，含13.6at.%Zr的Cr-Zr-Si-N薄膜具有高硬度、良好的机械性能、良好的摩擦学性能和优异的耐蚀性。
Cr–Zr–Si–N thin films with various Zr contents were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. In addition, a Cr–Zr–N film without Si addition was fabricated as a reference. The influence of Zr on the constitution, microstructure, mechanical, tribological and electrochemical properties of Cr–Zr–Si–N films was investigated. The microstructure of thin films was determined by a glancing angle X-ray diffractometer (GA-XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM), respectively. A nanoindenter, a Vickers micro hardness tester and pin-on-disk wear tests were adopted to evaluate the hardness, toughness and tribological properties of thin films, respectively. The electrochemical properties of thin films were also evaluated in 3.5wt.% NaCl aqueous solution. In case of the Cr–Zr–Si–N films, the Si content was fixed around 6–8at.% and various Zr contents ranging from 0.5 to 13.6at.% were achieved by changing the Zr target power density. In comparison to the Cr–Zr–N reference film, the addition of ~7.0at.% Si in Cr–Zr–Si–N films resulted in a refined columnar structure and enhanced mechanical and anti-corrosion properties. A lattice constant expansion of these films was observed with increasing Zr content. A nanostructured thin film with around 5–10nm grain size was obtained in case of a Cr–13.6at.% Zr–6.8at.% Si–N film. In general, the hardness, plastic deformation resistance and corrosion resistance increased also with increasing Zr content in the Cr–Zr–Si–N films. The Cr–Zr–Si–N film containing 13.6at.% Zr exhibited a combination of high hardness, good mechanical properties, adequate tribological performance and excellent corrosion resistance in this study.