C/SiC/Si-Mo-B/glass multilayer oxidation protective coating for carbon/carbon composites
C/SiC/Si-Mo-B/glass multilayer oxidation protective coating for carbon/carbon composites
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用于碳/碳复合材料的C/SiC/Si-Mo-B/玻璃多层氧化防护涂层
DOI：
10.1016/j.surfcoat.2011.07.085
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发表时间：
2011-10
影响因子：
5.4
通讯作者：
Zhang, Shou-Yang
中科院分区：
文献类型：
--
作者：
Zhang, Yu-Lei;Li, He-Jun;Yao, Xi-Yuan;Li, Ke-Zhi;Zhang, Shou-Yang
为防止C/C复合材料的氧化，采用包埋渗法和料浆法制备了由C/SiC梯度内层、Si-Mo-B中间层和玻璃外层组成的自封闭多层抗氧化涂层。利用扫描电镜和X射线衍射仪分析了涂层的显微组织和相组成。研究了涂层的恒温氧化和热冲击氧化性能。结果表明，该多层涂层在室温至1873 K范围内均表现出优异的抗氧化性能。在1173 K和1873 K温度下分别可有效保护C/C复合材料100 h和150 h，并能承受从1873 K到室温的40次热循环。多层涂层的梯度结构和自封闭性是其优异的抗氧化和抗热震性能的主要原因。
To prevent carbon/carbon (C/C) composites from oxidation, a self-sealing multilayer oxidation resistant coating including a C/SiC gradient inner layer, a Si-Mo-B middle layer and a glass exterior layer was prepared by pack cementation and slurry method. Scanning electron microscopy and X-ray diffraction were used to analyze the microstructure and phase composition of the as-prepared coating. The isothermal and thermal shock oxidation resistance of the coating was also investigated. The results showed that the multilayer coating exhibited excellent oxidation resistance from room temperature to 1873K. It could effectively protect C/C composites for 100h at 1173K and 150h at 1873K, and endure 40 thermal cycles between 1873K and room temperature. The excellent oxidation and thermal shock resistance could be attributed to the gradient structure and the self-sealing property of the multilayer coating.
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影响因子：
10.9
作者：
Jacobson, NS;Curry, DM
通讯作者：
Curry, DM
DOI：
10.1016/s0955-2219(98)00242-8
发表时间：
1997-04
期刊：
Key Engineering Materials
影响因子：
--
作者：
H. Fritze;J. Jojic;T. Witke;C. Rüscher;S. Weber;S. Scherrer;B. Schultrich;G. Borchardt
通讯作者：
H. Fritze;J. Jojic;T. Witke;C. Rüscher;S. Weber;S. Scherrer;B. Schultrich;G. Borchardt
影响因子：
8.3
作者：
T. Feng;Hejun Li;Q. Fu;Xue-tao Shen;Heng Wu
通讯作者：
T. Feng;Hejun Li;Q. Fu;Xue-tao Shen;Heng Wu
影响因子：
4.4
作者：
Kazuhiro Ito;T. Murakami;Katsuyuki Adachi;M. Yamaguchi
通讯作者：
Kazuhiro Ito;T. Murakami;Katsuyuki Adachi;M. Yamaguchi
影响因子：
10.9
作者：
Q. Fu;Hejun Li;Kezhi Li;Xiaohong Shi;Min Huang
通讯作者：
Q. Fu;Hejun Li;Kezhi Li;Xiaohong Shi;Min Huang