THE GROWTH AND ANNEALING OF SINGLE CRYSTALLINE ZNO FILMS BY LOW-PRESSURE MOCVD
THE GROWTH AND ANNEALING OF SINGLE CRYSTALLINE ZNO FILMS BY LOW-PRESSURE MOCVD
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DOI：
10.1016/s0022-0248(02)01474-4
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发表时间：
2002-08
影响因子：
1.8
通讯作者：
Jiandong Ye;S. Gu;Shunming Zhu;Tong T. Chen;Liqun Hu;F. Qin;Rong Zhang;Yi Shi;Youdou Zheng
中科院分区：
文献类型：
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作者：
Jiandong Ye;S. Gu;Shunming Zhu;Tong T. Chen;Liqun Hu;F. Qin;Rong Zhang;Yi Shi;Youdou Zheng
