Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering.
Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering.
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放电功率水平对射频磁控溅射 Ti6Al4V 沉积羟基磷灰石薄膜性能的影响
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发表时间：
1995
期刊：
影响因子：
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通讯作者：
J. Jansen
中科院分区：
文献类型：
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作者：
K. van Dijk;H. Schaeken;J. Wolke;C. Marée;F. Habraken;J. Verhoeven;J. Jansen
研究了放电射频功率和膜厚对射频磁控溅射Ca5(PO4)3OH(羟基磷灰石)薄膜特性的影响。通过α-step（厚度）、扫描电子显微镜（SEM）、X射线衍射（XRD）、卢瑟福背散射光谱（RBS）和红外吸收光谱（FTIR）研究了结构和化学成分。对溅射薄膜和在氩气流下 550 摄氏度退火后的薄膜进行了分析。 SEM显示薄膜表面没有裂纹或其他缺陷。 X射线衍射表明，低放电射频功率下沉积的薄膜为非晶态，高放电射频功率下沉积的薄膜为晶态。退火后，所有薄膜均具有与磷灰石相同的晶体结构。然而，RBS 测量表明，所有薄膜的钙磷酸比均高于标准合成羟基磷灰石。此外，RBS 数据的统计测试表明，Ca/P 比与放电功率水平之间仅存在微弱的相关性。尽管所有溅射薄膜在红外光谱中都显示出磷酸盐键，但只有在退火后，羟基磷灰石的OH键才变得可见。
The effects of discharge radiofrequency (RF) power and film thickness were studied on the characteristics of Ca5(PO4)3OH (hydroxyapatite) thin films fabricated by RF magnetron sputtering. The structure and chemical composition were investigated with alpha-step (thickness), scanning electron microscopy (SEM), X-ray diffraction (XRD), Rutherford backscattering spectrometry (RBS), and infrared absorption spectrometry (FTIR). The films were analyzed as-sputtered and after annealing at 550 degrees C under argon flow. SEM showed that the film surfaces had no cracks or other defects. X-ray diffraction showed that the deposited films were amorphous with low-discharge RF power, and crystalline with high-discharge RF power. After annealing, all the films had the same crystalline structure as apatite. However, the RBS measurements revealed that all films had a higher calcium-phosphate ratio than standard synthetic hydroxyapatite. Furthermore, statistical testing of the RBS data revealed the existence of only a weak correlation between the Ca/P ratio and the discharge power level. Although all sputtered films showed phosphate bonds in the infrared spectrum, only after annealing did the OH bonds of hydroxyapatite become visible.