Trends in low energy electron microscopy
Trends in low energy electron microscopy
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DOI：
10.1088/0953-8984/22/8/084017
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发表时间：
2010-03-03
影响因子：
2.7
通讯作者：
Altman, M. S.
中科院分区：
文献类型：
--
作者：
Altman, M. S.
低能电子显微镜（LEEM）和自旋极化LEEM（SPLEEM）是两种强大的原位技术，用于研究表面，薄膜和其他表面支撑的纳米结构。它们的实时成像和互补衍射能力允许以高空间和时间分辨率研究结构，形态，磁性和动态过程。在方法，仪器和理解的新的对比度机制，从波的性质和自旋自由度的电子继续推进应用LEEM和SPLEEM在这些领域和超越。我们在这里回顾的基本成像原理和最近的发展，展示了这些技术的当前能力，并提出了潜在的未来发展方向。
Low energy electron microscopy (LEEM) and spin polarized LEEM (SPLEEM) are two powerful in situ techniques for the study of surfaces, thin films and other surface-supported nanostructures. Their real-time imaging and complementary diffraction capabilities allow the study of structure, morphology, magnetism and dynamic processes with high spatial and temporal resolution. Progress in methods, instrumentation and understanding of novel contrast mechanisms that derive from the wave nature and spin degree of freedom of the electron continue to advance applications of LEEM and SPLEEM in these areas and beyond. We review here the basic imaging principles and recent developments that demonstrate the current capabilities of these techniques and suggest potential future directions.