Influence of negative bias voltage and deposition temperature on microstructure and properties of superhard TiB2 coatings deposited by high power impulse magnetron sputtering
Influence of negative bias voltage and deposition temperature on microstructure and properties of superhard TiB2 coatings deposited by high power impulse magnetron sputtering
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DOI：
10.1016/j.surfcoat.2014.05.023
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发表时间：
2014-08
影响因子：
5.4
通讯作者：
T. Zhang;B. Gan;Seongkyu Park;Q. Wang;K. Kim
中科院分区：
文献类型：
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作者：
T. Zhang;B. Gan;Seongkyu Park;Q. Wang;K. Kim
在含有大量靶离子的高功率脉冲磁控溅射(HIPIMS)等离子体中，利用衬底偏压吸引溅射离子是至关重要的。采用HIPIMS技术，分别在200℃和300℃的沉积温度下，以TiB2化合物靶材为原料制备了TiB2超硬涂层。研究了在200℃和300℃下的偏压对−涂层的化学成分、相结构、显微组织、表面形貌、力学性能和纳米晶性能的影响。结果表明，随着偏压的增大，薄膜的化学成分和微观结构发生了明显的变化。温度为200℃时，−为50nV至−为100nV的中等偏压下，离子能量和表面原子迁移率均有所提高，而当−为100nV至−为200nV时，再溅射效应被诱导出来。在−为100nV时沉积的TiB2涂层具有最好的机械性能和纳米级性能以及最低的表面粗糙度。在30 0℃时，随着偏压从0°V增加到−，表面吸附原子迁移率的不断增加是影响涂层性能的主要因素。当−为200V时，TiB2涂层具有最好的力学性能和纳米管性能以及最低的表面粗糙度。
It is critical to utilize the substrate bias voltage to attract the sputtered ions in high power impulse magnetron sputtering (HIPIMS) plasmas which contain a large amount of target ion species. In this work, superhard titanium diboride (TiB2) coatings were synthesized from TiB2compound target by a HIPIMS technique at deposition temperatures of 200 °C and 300 °C, respectively. The substrate bias voltage was altered from 0 V to − 200 V. The influence of the bias voltage at 200 °C and 300 °C on the chemical composition, phase structure, microstructure, surface morphology, mechanical and nanowear properties of the TiB2coatings was investigated. The results indicated that the chemical composition and microstructure were significantly altered by increasing the bias voltage. At 200 °C, the moderate bias voltage of − 50 V to − 100 V lead to enhanced ion energy and surface adatom mobility while the resputtering effect was induced as the bias voltage further increased from − 100 V to − 200 V. The TiB2coating deposited at − 100 V exhibited the best mechanical and nanowear properties and lowest surface roughness. At 300 °C, the continuous increase of the surface adatom mobility as the bias voltage increased from 0 V to − 200 V acted as the dominant influence factor for the coating properties. The TiB2coating with the best mechanical and nanowear properties and lowest surface roughness was obtained at − 200 V.