Ultraviolet lasing in resonators formed by scattering in semiconductor polycrystalline films
Ultraviolet lasing in resonators formed by scattering in semiconductor polycrystalline films
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DOI:
10.1063/1.122853
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发表时间:
1998-12-21
影响因子:
4
通讯作者:
Chang, RPH
中科院分区:
文献类型:
--
作者:
Cao, H;Zhao, YG;Chang, RPH
A semiconductor laser whose cavities are "self-formed" due to strong optical scattering in highly disordered gain media is demonstrated. The lasers are made of zinc oxide polycrystalline films grown on amorphous fused silica substrates. Lasing occurs at an ultraviolet wavelength of similar to 380 nm under optical pumping. Actual images of the microscopic laser cavities formed by multiple scattering have been captured. These results suggest the possibility of using disordered semiconductor microstructures as alternative sources of coherent light emission. (C) 1998 American Institute of Physics. [S0003-6951(98)00750-5].