Methods for controlling the pore properties of ultra-thin nanocrystalline silicon membranes
Methods for controlling the pore properties of ultra-thin nanocrystalline silicon membranes
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DOI：
10.1088/0953-8984/22/45/454134
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发表时间：
2010-11-17
影响因子：
2.7
通讯作者：
Fauchet, P. M.
中科院分区：
文献类型：
--
作者：
Fang, D. Z.;Striemer, C. C.;Fauchet, P. M.
多孔纳米晶硅 (pnc-Si) 膜是一类新型固态超薄膜，具有广阔的应用前景，从生物分离到用作电子成像和光谱学平台。由于膜的厚度仅为15-30 nm，与待分离分子的厚度相当，因此通过膜的传质大大增强。对于涉及分子分离的应用，至关重要的是膜对某些物种具有高度渗透性，而对其他物种几乎不可渗透。调节膜渗透性的一个重要方法是改变孔的大小和密度。对于 pnc-Si，快速热处理用于诱导纳米晶硅薄膜中形成纳米孔，然后使用各向异性蚀刻剂将其释放到硅支架上。在这项研究中，我们研究了薄膜沉积和热处理参数对孔径和密度的影响。
Porous nanocrystalline silicon (pnc-Si) membranes are a new class of solid-state ultra-thin membranes with promising applications ranging from biological separations to use as a platform for electron imaging and spectroscopy. Because the thickness of the membrane is only 15-30 nm, on the order of that of the molecules to be separated, mass transport through the membrane is greatly enhanced. For applications involving molecular separations, it is crucial that the membrane is highly permeable to some species while being nearly impermeable to others. An important approach to adjusting the permeability of a membrane is by changing the size and density of the pores. With pnc-Si, a rapid thermal treatment is used to induce nanopore formation in a thin film of nanocrystalline silicon, which is then released over a silicon scaffold using an anisotropic etchant. In this study, we examine the influence of thin film deposition and thermal treatment parameters on pore size and density.