The correlation between ion beam/material interactions and practical FIB specimen preparation
The correlation between ion beam/material interactions and practical FIB specimen preparation
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DOI：
10.1017/s143192760030034
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发表时间：
2003-06-01
影响因子：
2.8
通讯作者：
Stevie, FA
中科院分区：
文献类型：
--
作者：
Prenitzer, BI;Urbanik-Shannon, CA;Stevie, FA
聚焦离子束(FIB)既是一种独立的分析仪器，也是一种制备样品以供随后的扫描电子显微镜、电子显微镜、SIMS、XPS和俄歇分析的手段。在这项工作中，特别强调了用FIB提拉技术制备透射电子显微镜样品。在电子透明膜的制备方面，研究和讨论了支配FIB球磨过程的基本离子/固体相互作用。TRIM是一种蒙特卡罗模拟程序，用于对影响FIB溅射行为的变量进行物理建模。这种计算机生成的模型的结果与在FEI 611 FIB工作站上处理的许多材料的经验观测结果进行了比较。考虑了入射离子攻角、束流、沟槽几何形状、光栅图和靶材相关的去除率等因素的影响。这些相互关系被用来解释观察到的现象并预测预期的铣削行为，从而增加了FIB更有效地利用的潜力和可重复性的结果。
The focused ion beam (FIB) tool has been successfully used as both a stand alone analytical instrument and a means to prepare specimens for subsequent analysis by SEM, TEM, SIMS, XPS, and AUGER. In this work, special emphasis is given to TEM specimen preparation by the FIB lift-out technique. The fundamental ion/solid interactions that govern the FIB milling process are examined and discussed with respect to the preparation of electron transparent membranes. TRIM, a Monte Carlo simulation code, is used to physically model variables that influence FIB sputtering behavior. The results of such computer generated models are compared with empirical observations in a number of materials processed with an FEI 611 FIB workstation. The roles of incident ion attack angle, beam current, trench geometry, raster pattern, and target-material-dependent removal rates are considered. These interrelationships are used to explain observed phenomena and predict expected milling behaviors, thus increasing the potential for the FIB to be used more efficiently with reproducible results.