Variable Magnification With Kirkpatrick-Baez Optics for Synchrotron X-Ray Microscopy

Variable Magnification With Kirkpatrick-Baez Optics for Synchrotron X-Ray Microscopy
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用于同步加速器 X 射线显微镜的 Kirkpatrick-Baez 光学器件的可变放大倍率

DOI:
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发表时间:
2006
影响因子:
1.5
通讯作者:
A. Macrander
A. Macrander
中科院分区:
工程技术4区
文献类型:
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作者:
T. Jach;A. Bakulin;S. Durbin;J. Pedulla;A. Macrander

文献摘要

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我们描述的操作之间的区别形成一个真实的图像与实验室源(会聚照明)和高度准直的强光束从同步加速器光源(科勒照明)的短焦距X射线显微镜。我们证明的区别与柯克帕特里克-贝兹显微镜组成的短焦距的多层膜反射镜工作在8千电子伏的能量。除了实现光学分辨率的提高,同步辐射显微镜不限于通常的单一放大率在一个固定的图像平面。在几何光学的极限下,用准直光束投影产生更高放大倍数的图像。然而,与将样品放置在发散光束的光源后面的常见方法不同,我们描述了样品位于光学元件之前的准直光束中的情况。放大倍数的极限是由样品的衍射引起的,并由样品相对于光学系统焦点的位置决定。我们提出的标准,衍射最小化。
We describe the distinction between the operation of a short focal length x-ray microscope forming a real image with a laboratory source (convergent illumination) and with a highly collimated intense beam from a synchrotron light source (Köhler illumination). We demonstrate the distinction with a Kirkpatrick-Baez microscope consisting of short focal length multilayer mirrors operating at an energy of 8 keV. In addition to realizing improvements in the resolution of the optics, the synchrotron radiation microscope is not limited to the usual single magnification at a fixed image plane. Higher magnification images are produced by projection in the limit of geometrical optics with a collimated beam. However, in distinction to the common method of placing the sample behind the optical source of a diverging beam, we describe the situation in which the sample is located in the collimated beam before the optical element. The ultimate limits of this magnification result from diffraction by the specimen and are determined by the sample position relative to the focal point of the optic. We present criteria by which the diffraction is minimized.