Variable Magnification With Kirkpatrick-Baez Optics for Synchrotron X-Ray Microscopy
Variable Magnification With Kirkpatrick-Baez Optics for Synchrotron X-Ray Microscopy
复制标题
用于同步加速器 X 射线显微镜的 Kirkpatrick-Baez 光学器件的可变放大倍率
DOI:
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发表时间:
2006
影响因子:
1.5
通讯作者:
A. Macrander
中科院分区:
文献类型:
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作者:
T. Jach;A. Bakulin;S. Durbin;J. Pedulla;A. Macrander
We describe the distinction between the operation of a short focal length x-ray microscope forming a real image with a laboratory source (convergent illumination) and with a highly collimated intense beam from a synchrotron light source (Köhler illumination). We demonstrate the distinction with a Kirkpatrick-Baez microscope consisting of short focal length multilayer mirrors operating at an energy of 8 keV. In addition to realizing improvements in the resolution of the optics, the synchrotron radiation microscope is not limited to the usual single magnification at a fixed image plane. Higher magnification images are produced by projection in the limit of geometrical optics with a collimated beam. However, in distinction to the common method of placing the sample behind the optical source of a diverging beam, we describe the situation in which the sample is located in the collimated beam before the optical element. The ultimate limits of this magnification result from diffraction by the specimen and are determined by the sample position relative to the focal point of the optic. We present criteria by which the diffraction is minimized.