Structural and magnetic properties of NixFe1-x evaporated thin films
Structural and magnetic properties of NixFe1-x evaporated thin films
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DOI：
10.1016/0304-8853(87)90720-7
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发表时间：
1987-05
影响因子：
2.7
通讯作者：
G. Dumpich;E. Wassermann;V. Manns;W. Keune;S. Murayama;Y. Miyako
中科院分区：
文献类型：
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作者：
G. Dumpich;E. Wassermann;V. Manns;W. Keune;S. Murayama;Y. Miyako
摘要 通过电子束蒸发将各种成分（x< 0.27 和 x> 0.46）的 Ni x Fe 1-x 合金薄膜真空沉积到石英晶体基板上。 Ni x Fe 1-x 薄膜的结构特性通过电子微探针分析 (EPMA)、X 射线衍射和 TEM 研究获得。磁性通过 M (H, T) 和转换电子穆斯堡尔能谱 (CEMS) 测量来确定。这些给出了蒸发膜的饱和磁化强度M s (x) 和平均超精细场B hf (x) 的浓度依赖性。该结果与其他作者研究过的块状 Ni x Fe 1-x 合金和溅射 Ni x Fe 1-x 合金薄膜的结果进行了比较。蒸发和溅射 Ni x Fe 1-x 薄膜的磁性行为的比较使得我们有可能更深入地讨论 Ar 的影响，Ar 被认为在改变溅射 Ni x Fe 1-x 薄膜的磁性方面起决定性作用。
Abstract Thin Ni x Fe 1-x alloy films of various compositions (x< 0.27 and x> 0.46) were vacuum deposited onto quartz crystal substrates by electron beam evaporation. Structural properties of the Ni x Fe 1-x films were obtained by electron microprobe analysis (EPMA), X-ray diffraction and TEM-investigation. Magnetic properties were determined by M (H, T)-and conversion electron Mössbauer spectroscopic (CEMS) measurements. These gave the concentration dependence of the saturation magnetization M s (x) and the mean hyperfine field B hf (x) of the evaporated films. The results are compared to those found for bulk Ni x Fe 1-x alloys and sputtered Ni x Fe 1-x alloys films, which had been investigated by other authors. The comparison of the magnetic behavior of the evaporated and sputtered Ni x Fe 1-x films yields the possibility to discuss more intensively the influence of Ar which had been suggested to be decisive in changing the magnetic properties of sputtered Ni x Fe 1-x films.