Structure and properties of (AlCrMoNiTi)Nx and (AlCrMoZrTi)Nx films by reactive RF sputtering
Structure and properties of (AlCrMoNiTi)Nx and (AlCrMoZrTi)Nx films by reactive RF sputtering
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DOI：
10.1016/j.surfcoat.2013.08.064
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发表时间：
2013-11
影响因子：
5.4
通讯作者：
B. Ren;S. Yan;R. Zhao;Zhongxia Liu
中科院分区：
文献类型：
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作者：
B. Ren;S. Yan;R. Zhao;Zhongxia Liu
采用反应性射频（RF）磁控溅射技术，在不同n2 - ar流量比（RN）下制备了AlCrMoNiTi和AlCrMoZrTi氮化膜。研究了RNon对薄膜结构和性能的影响。两种合金薄膜均为非晶态结构，而在不同RN条件下制备的氮化物薄膜均为简单的面心立方固溶体结构。随着rn的增加，团簇、缺陷和薄膜厚度减小，导致致密的柱状结构和较低的表面粗糙度。在RN= 1.0时，AlCrMoZrTi氮化膜的峰值硬度为19.6 GPa， AlCrMoNiTi氮化膜的峰值硬度为15.4 GPa。在RN= 0.5时，AlCrMoNiTi和AlCrMoZrTi氮化膜的摩擦系数分别为0.15和0.13。经过1200 s的摩擦实验，AlCrMoZrTi氮化膜没有发生磨损。因此，AlCrMoZrTi氮化膜表现出比AlCrMoNiTi氮化膜更好的力学性能，这可能与Zr的固溶强化效果大于Ni有关。
The AlCrMoNiTi and AlCrMoZrTi nitride films were prepared by reactive radio-frequency (RF) magnetron sputtering at various N2-to-Ar flow ratios (RN). The influence of RNon the structure and properties of these films was investigated. The two alloy films presented an amorphous structure, while a simple face-centered-cubic (FCC) solid-solution structure was observed in the nitride films prepared under different RN. As the RNincreased, the clusters, defects and film thickness decreased, which resulted in a dense columnar structure and low surface roughness. Peak hardness of 19.6 GPa for AlCrMoZrTi nitride films and 15.4 GPa for AlCrMoNiTi nitride films were attained at RN= 1.0 respectively. At RN= 0.5, the friction coefficients of AlCrMoNiTi and AlCrMoZrTi nitride films were respectively 0.15 and 0.13. Moreover, the AlCrMoZrTi nitride films did not undergo wear-out after 1200 s friction experiment. Therefore, The AlCrMoZrTi nitride films exhibited better mechanical properties than that of AlCrMoNiTi nitride films, which may be related to the fact that the solid-solution strengthening effect of Zr was greater than that of Ni.