Pulsed dc Sputtered Nanocrystalline VN Coatings for Electrode Materials for Supercapacitors
Pulsed dc Sputtered Nanocrystalline VN Coatings for Electrode Materials for Supercapacitors
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DOI：
10.1166/jnn.2017.13374
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发表时间：
2017-06
影响因子：
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通讯作者：
Chun Sung‐Yong
中科院分区：
文献类型：
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作者：
Chun Sung‐Yong
采用直流和非对称双极脉冲直流磁控溅射制备了具有不同脉冲参数的超级电容器电极材料纳米晶氮化钒涂层。脉冲频率和占空比分别在 5 至 50 kHz 和 50 至 95% 范围内变化。当脉冲频率增加时，脉冲直流溅射薄膜的沉积速率、晶粒尺寸和电阻率降低，而氮化铌薄膜的纳米硬度增加。我们详细介绍涂层（例如沉积速率、晶粒尺寸、择优取向、电阻率和硬度）。我们的研究表明，使用非对称双极脉冲直流溅射可以制备具有优异性能的氮化铌涂层。
Nanocrystalline vanadium nitride coatings for electrode materials for supercapacitors with various pulse parameters have been prepared using dc (direct current) and asymmetric-bipolar pulsed dc magnetron sputtering. The pulse frequency and the duty cycle were varied from 5 to 50 kHz and 50 to 95%, respectively. The deposition rate, grain size and resistivity of pulsed dc sputtered films were decreased when the pulse frequency increased, while the nano hardness of niobium nitride films increased. We present in detail coatings (e.g., deposition rate, grain size, prefer-orientation, resistivity and hardness). Our studies show that niobium nitride coatings with superior properties can be prepared using asymmetric-bipolar pulsed dc sputtering.