Oxidation resistance and characterization of (AlCrMoTaTi)-Six-N coating deposited via magnetron sputtering

Oxidation resistance and characterization of (AlCrMoTaTi)-Six-N coating deposited via magnetron sputtering
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DOI:
10.1016/j.jallcom.2015.06.025
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发表时间:
2015-10
影响因子:
6.2
通讯作者:
Du-Cheng Tsai;M. Deng;Z. Chang;Bing-Hau Kuo;Erh-Chiang Chen;Shou-Yi Chang;F. Shieu
Du-Cheng Tsai;M. Deng;Z. Chang;Bing-Hau Kuo;Erh-Chiang Chen;Shou-Yi Chang;F. Shieu
中科院分区:
材料科学2区
文献类型:
--
作者:
Du-Cheng Tsai;M. Deng;Z. Chang;Bing-Hau Kuo;Erh-Chiang Chen;Shou-Yi Chang;F. Shieu

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采用反应磁控溅射法在Si基体上制备了不同的(AlCrMoTaTi)-Six-N涂层,系统研究了Si含量和游离Si对涂层氧化行为的影响。与无硅涂层相比,含硅涂层具有相对致密的结构。当涂层在高温下暴露于环境空气时,在涂层表面上形成氧化物层并继续氧化。在1073 K时,在氧化物层中形成了两层结构,即非晶Al 2 O3层和微量其它目标元素,然后是目标元素混合区的金红石型TiO 2+氧化物。随着涂层中Si含量的增加,涂层的抗氧化性能逐渐增强。在1173 K时,Si含量低至7.51at.%的涂层表现出一个数量级低于无硅涂层的氧化速率。涂层的纳米硬度测量进一步证实了氧化行为。涂层抗氧化性能的显著提高可能与涂层中Al和Si的存在有关。
Various (AlCrMoTaTi)-Six-N coatings were prepared on Si substrates through a reactive magnetron sputtering system to methodically investigate the effects of Si contents and free Si on oxidation behavior. The as-deposited Si-containing coating presented a relatively dense and compact structure compared with the Si-free coating. An oxide layer was formed on the coating surface and continued to thicken when the coatings were exposed to ambient air at elevated temperatures. At 1073 K, a two-layer structure, which consists of an amorphous Al2O3layer with traces of other target elements followed by a rutile TiO2+ oxide of the target element mixed zone, was developed in the oxide layer. Oxidation resistance was gradually enhanced with the continued increase in Si concentration in the coatings. At 1173 K, the coatings with Si content of as low as 7.51 at.% exhibited a single order of magnitude lower oxidation rate than that of the Si-free coating. Nanohardness measurement of the coatings further confirmed the oxidation behavior. The significantly enhanced oxidation resistance may be attributed to the presence of Al and Si in the coatings.