Low-energy electron-impact excitation of methane, silane, tetrafluoromethane and tetrafluorosilane
Low-energy electron-impact excitation of methane, silane, tetrafluoromethane and tetrafluorosilane
复制标题
甲烷、硅烷、四氟甲烷和四氟硅烷的低能电子轰击激发
DOI：
10.1039/f29898500659
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发表时间：
1989
期刊：
影响因子：
--
通讯作者：
I. Walker
中科院分区：
文献类型：
--
作者：
M. Curtis;I. Walker
用俘获电子能谱仪研究了甲烷、硅烷、四氟甲烷和四氟硅烷的电子冲击激发。用极低的入射能量观察到CF4的广泛振动激发。在SiH4中也有一些多重振动激发的证据，但该分子的结果并非完全明确。SiF4的近阈值振动激励被弹性散射的大截面效应所掩盖。找到了一些光学禁止的电子态，并提出了分配建议。短寿命负离子态（共振）影响SiH4、CF4和SiF4中最低激发态里德堡态的电子激发以及负离子的产生。
Electron-impact excitation of methane, silane, tetrafluoromethane and tetrafluorosilane has been explored in a trapped-electron spectrometer. Extensive vibrational excitation of CF4 was observed with electrons of very low incident energies. There was some evidence of multiple vibrational excitation in SiH4 also but the results for this molecule were not totally unambiguous. Nearthreshold vibrational excitation of SiF4 was masked by effects attributed to a large cross-section for elastic scattering. Some optically forbidden electronic states have been located and assignments suggested. Short-lived negative-ion states (resonances) affect electronic excitation of the lowest excited Rydberg state in SiH4, CF4 and SiF4 as well as negative-ion production.