Photosensitive poly(dimethylsiloxane) materials for microfluidic applications
Photosensitive poly(dimethylsiloxane) materials for microfluidic applications
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DOI：
10.1016/j.mee.2007.01.011
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发表时间：
2007-05-01
影响因子：
2.3
通讯作者：
Gogolides, Evangelos
中科院分区：
文献类型：
--
作者：
Tsougeni, Katerina;Tserepi, Angeliki;Gogolides, Evangelos
聚二甲基硅氧烷(PDMS)是微流体和生物微机械中的一种热交联材料。近年来，随着多层结构对易于取向的需求的增加，可光图案材料显示出越来越大的兴趣。我们提出了一种用于微流体中的PDMS的光图案化工艺，主要用于两个用途：(A)作为薄的(约10 pm)结构层，和(B)作为非常薄(约1g)的硬掩膜，用于氧等离子体刻蚀小至几十微米的微流控聚合物衬底。我们研究了以乙烯基甲基硅氧烷为可聚合基团的硅氧烷共聚物的深紫外光和I线光交联性。这些材料对DUV很敏感，可以用自由基引发剂敏化到300-400 nm。我们证明，即使是热固化的PDMS(Sylgard 184，碱)也可以在DUV中变得光敏，尽管由于其小分子量，其实际应用仅限于非常薄的薄膜。(C)2007 Elsevier B.V.保留所有权利。
Poly(dimethylsiloxane) (PDMS) is used as a thermally crosslinked material in microfluidics and Bio-MEMS. Recently photo-patternable materials show increasing interest, as the demand for easy alignment arises for multilayered structures. We present a photo-patterning process for PDMS in microfluidics, for two main uses: (a) as a thin (approximately 10 pm) structural layer, and (b) as a very thin (approximately I gm) hard mask for oxygen plasma etching of microfluidic polymeric substrates down to several tens of microns. We study the deep-UV and I-line photocrosslinking properties of siloxane copolymers containing vinyl-methyl-siloxane groups as polymerizable units. These materials are sensitive to DUV and can be sensitized to 300-400 nm using free radical initiators. We prove that even thermally curable PDMS (Sylgard 184, base) can become photosensitive in DUV, although its practical use is limited to very thin films, due to its small molecular weight. (c) 2007 Elsevier B.V. All rights reserved.