Fractal microstructure of Ag film via plasma discharge as SERS substrates
Fractal microstructure of Ag film via plasma discharge as SERS substrates
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通过等离子体放电作为 SERS 基底的银膜的分形微观结构
DOI：
10.1088/1674-1056/ac0693
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Wang Xianping
中科院分区：
文献类型：
--
作者：
Kan Xuefen;Yin Cheng;Cao Zhuangqi;Su Wei;Shan Minglei;Wang Xianping
基于大气压等离子体（APP）技术，提出了一种快速合成增强拉曼光谱衬底的方法。等离子体对银膜表面进行修饰和蚀刻，产生大规模的热点聚集。通过切换放电极性和调节薄膜厚度，使等离子体产物在一定空间内发生氧化、反应蚀刻和积累，形成不同的表面形貌。特别是在正电晕放电条件下，在电场对表面扩散的影响下，单个纳米颗粒逐渐连接，形成致密的蛇形微观结构。此外，实验验证了相应的增强因子（EF）至少提高了5个数量级，处理时间约为10 min。
According to the atmospheric pressure plasma (APP) technology, we propose a rapid synthetic approach of the substrates for enhanced Raman spectroscopy. The plasma is used to modify and etch the surface of silver film, which generates large scale hotspots’ aggregation. By switching the discharge polarity and adjusting the film thickness, different surface morphologies are formed due to the oxidation, reactive etch and accumulation of the plasma product in a certain space. Especially under positive corona discharge condition, dense snake-like microstructures are formed by the gradual connection of individual nanoparticles, which are driven by the influence of the electric field on surface diffusion. In addition, the experiments verify that the corresponding enhancement factor (EF) raises at least five orders of magnitude and the treatment time is about 10 min.