Development and Testing of an Advanced Electron Optical System for Photoelectron Microscopes and Other High Resolution Imaging Systems

这项拨款申请旨在为波特兰州立大学和俄勒冈大学联合项目的第二阶段提供资金，该项目旨在开发设计先进、分辨率更高的光电子显微镜（PEM）（理论上为1纳米至2纳米，而目前为10纳米）。该项目将通过结合一个电子镜来校正色差和球差来达到这个分辨率。该项目的第一阶段由西北地区的一家私人基金会（M. J. Murdock Chawitable Trust）资助。第一阶段包括电子反射镜的设计和构造，电子透镜和其他用于研究反射镜的组件，以及反射镜特性的理论和实验研究。第二阶段，计划三年，重点是进一步研究像差校正，镜面设计，偏转器设计以及仪器设计和建造。具体目标包括：在真空光学实验台上，结合光电子显微镜的电子光学元件，详细研究反射镜的像差校正特性，并设计和建造一个实验测试柱，用于评估校正后的电子光学系统的分辨率。修正系统的成功演示将代表电子光学领域的一个进步。该校正方法也适用于需要像差校正和提高分辨率的一系列其他仪器（例如，电子或离子探针和先进的光电子显微镜），完成后将在有机和生物标本，半导体，在其他表面研究中，高分辨率和低试样损伤是很重要的。

This grant application seeks funds to carry out the second phase of a joint project between Portland State University and the University of Oregon on the development of a photoelectron microscope (PEM) of advanced design and higher resolution (theoretically 1 nm to 2 nm, as compared with the present 10 nm). The project will achieve this resolution by incorporating an electron mirror to correct for chromatic and spherical aberrations. The first phase of this project was funded by a private foundation in the Northwest (the M. J. Murdock Chawitable Trust). The first phase covered the design and construction of an electron mirror and the electron lenses and other components used in studying the mirror, and theoretical and experimental investigations of the mirror properties. The second phase, planned for three years, focuses on further research on aberration correction, on mirror design, deflector design, and on instrument design and construction. Specific goals include a detailed study of the aberration correcting properties of the mirror in combination with the electron optical components of the photoelectron microscope in a vacuum optical bench, and the design and construction of an experimental test column in which the resolution of the corrected electron optical system can be evaluated. The successful demonstration of a corrected system would represent an advanced in the field of electron optics. The correction method would also be applicable to a range of other instruments which require aberration correction and improved resolution (e.g., electron or ion probes and advanced photoelectron microscope, when completed, will be valuable in studies of organic and biological specimens, semiconductors, and other surface studies where high resolution and low specimen damage are important.