Presidential Young Investigators Award: Sources and Applications for Short Wavelength Electromagnetic Radiation

研究计划在以下方面取得新的进展： 毫米和亚毫米波源，以及它们的 应用. 这项工作将基于先前的 开发毫米波Free的经验 电子束电压降低的电子激光器 (both高功率0.5- 1.0MV自由电子激光振荡器 和50 kV谐波“ubitron”放大器）。 的 然而，新的方向将强调研究 紧凑的“低”电压（100 kV），以及 中等功率（0.1-100千瓦）设备， 与商业实用民用 和政府应用。 完成 这一领域、研究的新发展 电子束产生的创新， 聚焦技术、小尺度辐射腔 周期性结构和非线性效率 增强和模式控制技术将 执行。 关于Compact的研究 周期性结构作为一个研究的机会， 开发，并执行（缩放）新的测试 高能电子插入装置 将进行储存环。 这种插入 这些设备应该扩展美国 储存环设施作为高亮度红外， 真空紫外线和X射线光源设施， 光谱学、材料科学、平版印刷， 和生物医学应用。 最后，此外， 对于陶瓷烧结工艺， 中等功率的几种新应用 毫米波源，例如， 一个紧凑的，高密度的，镜像等离子体， 有效地产生用于光刻的软X射线 和材料加工应用。 另一 感兴趣的是研究毫米波的使用， 电介质的改进的热处理 镀层. 第三个感兴趣的领域是 前面提到的使用相干亚毫米 源，（即，波长在0.01-1.0 mm之间） 用于各种化学链的光谱分析 反应与固态半导体 现象。

Research is planned to make new advances in mm-and sub-mm wave sources, as well as their applications. This work will be based on prior experience in developing mm-wave Free Electron Laser devices at reduced beam voltages (both high power 0.5-1.0 MV FEL oscillators and 50 kV harmonic "ubitron" amplifiers). The new directions, however, will emphasize studies of compact, "low" voltage ( 100 kV), and moderate power (0.1-100 kW) devices to be compatible with commercially practical civilian and government applications. To accomplish new developments in this field, research innovations in electron beam generation and focusing techniques, small-scale radiation cavities and periodic structures, and nonlinear efficiency enhancement and mode control techniques will be carried out. Also research on compact periodic structures as an opportunity to research, develop, and perform (scaled) testing of new insertion devices for high energy electron storage rings will be performed. Such insertion devices should extend the capabilities of U.S. storage ring facilities as high brightness IR, VUV, and x-ray light source facilities for spectroscopic, materials science, lithographic, and biomedical applications. Finally, in addition to the ceramic sintering process, there are several new applications for moderate power mm-wave sources such as, mm-wave heating of a compact, high density, mirror plasma to efficiently generate soft x-rays for lithography and materials processing applications. Another interest is to study the use of mm-waves for improved thermal processing of dielectric coatings. A third area of interest would be the previously mentioned use of coherent sub-mm sources, (i.e., wavelengths between 0.01-1.0 mm) for spectroscopy of various chemical chain reactions and solid-state semi-conductor phenomena.