Microchannel Plate Amplifiers by Accelerator Bombardment and Particle Track Etching

本研究将探讨一种制作方法， 微通道板将保持增益， 提高现有技术的效率，同时改善空间 解决方案和响应时间至少增加十倍。 这个新 方法是基于加速器轰击和粒子径迹 蚀刻 一个高能粒子穿过一片 基础玻璃会留下潜在的破损痕迹 当 浸没在蚀刻溶液中，材料沿着损伤 痕迹优先蚀刻形成锥形坑， 彼此相对 来自相对表面的成对蚀坑 合并形成圆柱体 由蚀刻条件控制。 第一阶段将决定 无论通道中的最终表面是否具有电性， 适合于颗粒结构和散装材料性质 检测和信号放大。

This research will investigate a method for fabricating microchannel plates which will preserve the gain and efficiency of existing techniques while improving spatial resolution and response time at least tenfold. This new method is based on accelerator bombardment and particle track etching. Passage of a high energy particle through a sheet of base glass leaves a latent damage trail of broken bonds. When submerged in an etching solution, material along the damage trail etches preferentially to form conical pits which grow toward each other. Pairs of etch pits from opposite surfaces merge to form cylinders which may be shaped into microchannels controlled by etching conditions. Phase I will determine whether the resulting surface in the channel has electrical, structural, and bulk material properties suitable for particle detection and signal amplification.