Innovative High Powered Vacuum Ultra Violet Light Source

一种高功率密度（大于1000w /cc）的微波驱动等离子体光源已经被开发出来，它有可能成为一种高效的真空紫外线（VUV）光源。这一评估是基于之前的光谱测量和在大气压下产生的蒸汽等离子体的功率平衡分析，功率只有6千瓦。我们提出了一种新的200 nm以下的高功率紫外光源。这类光源可以潜在地应用于光刻和聚合物的表面处理。

9361318 McNeill A high power density (greater than 1,000 W/cc) microwave-driven plasma source has been developed, and it can potentially be an efficient vacuum ultra violet (VUV) light source. This assessment is based upon previous spectroscopic measurements and power balance analysis of steam plasmas created at atmospheric pressure with only 6 kW of power. We propose to a new UV light source with high power below 200 nm. This class of light source can be potentially applied to photolithography and surface treatment of polymers.