Single Crystal Thin Films of Complex Oxide Ceramics by Pulsed Liquid Injection Metalorganic Chemical Vapor Decomposition

9400180 Raj这项研究的目标是开发一种新的制造设计概念，用于从金属有机前体合成复杂氧化物的单晶薄膜。这一概念体现了分子控制的逐层生长、薄膜的大面积单晶生长、低环境影响以及经济灵活的桌面设计。该概念采用脉冲注入非常少量的液体前驱体直接进入低压反应器，以实现原子层对原子层的单晶膜生长。利用超声波喷嘴获得每脉冲可重复的沉积是该研究的一个特点。该研究的具体目标是为加工参数开发可行的模型，这些模型可用于根据提出的概念为特定应用定制制造系统。这项研究将产生的过程将使用于微电子器件的单晶薄膜的生长速度的单层控制成为可能，同时，允许相当大的灵活性，成本效益和制造潜力，以制造各种成分的大面积衬底的薄膜。

9400180 Raj The goal of this research is the development of a new manufacturing design concept for the synthesis of single crystal thin films of complex oxides from metalorganic precursors. The concept embodies molecular control for layer-by-layer growth, large area single crystal growth of thin films, low environmental impact, and a table top design that is economical and flexible. The concept employs pulsed injection of very small amounts of liquid precursors directly into a low pressure reactor in order to achieve atom-layer by atom-layer growth of single crystal films. The use of an ultrasonic nozzle to obtain reproducible deposition per pulse is a special feature of the research. The specific objective of the research is to develop viable models for the processing parameters that can be used to tailor manufacturing systems, based on the proposed concept, for specific applications. The process that will result from this research will enable monolayer-level control for the growth rate of the single crystal films used in microelectronic devices and, at the same time, allow considerable flexibility, cost-effectiveness and manufacturing potential for making films of various compositions of large area substrates.