U.S.-Australia Workshop on Critical Issues in High Performance Wear Resistant Films/Sydney, Australia/February 1995

9417020佩里该奖项将支持12名美国研究人员参加高性能、耐磨薄膜领域的研讨会。会议将于1995年2月在澳大利亚悉尼举行。美国协调员安东尼·J·佩里博士是位于加利福尼亚州圣地亚哥的ISM Technologies，Inc.的研究和技术总监。澳大利亚的组织者是悉尼CSIRO国家测量实验室表面工程小组的研究科学家菲利普·J·马丁博士。研讨会是根据美澳合作科学计划进行的，澳大利亚的支持是通过工业、科学和技术部(DIST)提供的。采用物理气相沉积(PVD)方法制备的硬质膜提高了表面的耐磨性和耐腐蚀性。关键问题是膜-基界面的制备和处理，以实现最大的附着力，形成致密、机械坚固的膜，以及膜性能的测量和控制。研讨会将汇聚基础广泛的PVD研究重要领域的领先研究人员。参加研讨会的美国人将带来薄膜机械性能测量和控制方面的专业知识；澳大利亚方面在溅射和阴极电弧蒸发方面的PVD技术方面拥有丰富的专业知识。预计讲习班手稿将与科学期刊《表面涂层和技术》一起出版。

9417020 Perry This award will support the participation of twelve U. S. investigators to take part in a workshop in the area of high performance, wear resistant films. The meeting will be held in Sydney, Australia in February 1995. The American coordinator is Dr. Anthony J. Perry, Director for Research and Technology at ISM Technologies, Inc. located in San Diego, California. The Australian organizer is Dr. Philip J. Martin, Research Scientist with the Surface Engineering Group at the CSIRO National Measurement Laboratory in Sydney. The workshop is being conducted under the U.S.-Australia Cooperative Science Program and support in Australia is provided through the Department of Industry, Science and Technology (DIST). Hard films made by Physical Vapor Deposition (PVD) improve both wear and corrosion resistance of surfaces. The critical issues are the preparation and treatment of the film-substrate interface for maximum adhesion, the formation of dense, mechanically robust films, and the measurement and control of film properties. The workshop will bring together leading researchers in the significant areas of broad based PVD studies. The U.S. participants to the workshop will bring expertise in the measurement and control of film mechanical properties; the Australian side has considerable expertise in PVD technology in sputtering and cathodic arc evaporation. It is anticipated that workshop manuscripts will be published in connection with the scientific journal Surface Coatings and Technology.