A Lithography Stage of High Performance

952989张本项目将开发设计、建造和测试一个定位平台的方法，该平台的分辨率为5纳米，可重复性为20纳米，行程范围为300毫米，移动速度高达50毫米/秒。驱动器是线性压电马达，消除了滚珠丝杠及其相关的间隙问题。这种驱动和柔性设计增加了定位台的刚度。研究方法将涵盖动态建模、控制系统设计和误差预算来预测设计目标。在与工业合作伙伴的合作下，他们将建立和测试高精度的X-Y-Z-theta平台。这项研究将在精密制造行业产生影响，其中分析工具将用于利用这种类型的平台的精度和高刚度，从而实现快速，准确的定位。半导体光刻设备和其他精密机械定位系统都要求设计方法和该技术能够经济地制造更高密度的半导体。

952989 Zhang This project will develop methods to design, build and test a positioning stage with resolution of 5 nanometers, repeatability of 20 nanometer over a 300 mm range of travel, while moving at speed of up to 50 mm/s. The drives are linear piezomotors, eliminating ball screws and their associated backlash problems. This drive and a flexure design increase the stiffness of a positioning stage. The research approach will cover the dynamic modeling, control system design, and error budgeting to predict the design targets. In cooperation with an industrial partner, they will build and test a high precision, X-Y-Z-theta stage. The impact of this research will be in the precision manufacturing industries, where the analysis tools will be used to take advantage of the precision and high stiffness of this type of stage, allowing fast, accurate positioning. Semiconductor lithography equipment, and other precision mechanical position systems, require both the design methods and this technology to be able to manufacture higher density semiconductors economically.