SBIR Phase I: "RT Photocurable Preceramic Polymers to Si3N4 Ceramics"

这个小型企业创新研究(SBIR)第一阶段项目将展示一种创新的可光固化的“按需固化”室温前驱体聚合物方法，用于制造高产量氮化硅(Si3N4)和Si3N4/碳化硅陶瓷。以前还没有证明过可光固化的前陶瓷聚合物到氮化硅或任何其他氮化物陶瓷。概念的证明将通过在热解前合成并随后光交联聚(乙炔基)硅烷(PESZ)来证明。这有望得到一种低介电、低蠕变、高陶瓷产率的母材或涂层，具有广泛的应用前景。这代表了一种新的核心使能技术，具有在微电子、热管理和高温结构应用方面的潜力。具体地说，氮化硅的高强度、高温稳定性、高导热性和不同寻常的介电特性的独特组合使其适合于独特的应用，包括微波电子、高超声速拦截器鼻锥和天线的混合电路基板。光固化使碳化物和氮化物陶瓷的最终光刻图案化成为可能。

This Small Business Innovation Research (SBIR) Phase I project will demonstrate an innovative photo-curable "cure on demand" room temperature preceramic polymer approach for the fabrication of high yield silicon nitride (Si3N4) and Si3N4/SiC ceramics. No photo-curable preceramic polymer to silicon nitride or any other nitride ceramic has ever been previously demonstrated. The proof of concept will be demonstrated by synthesizing and subsequently photo-cross-linking poly(ethynyl)silizane (PESZ) prior to pyrolysis. This is expected to result in a low-dielectric, low creep, high ceramic yield matrix or coating with wide applications. This represents a new core enabling technology with potential for microelectronics, thermal management, and high temperature structural applications. Specifically, the unique combination of high strength, high temperature stability, high thermal conductivity, and unusual dielectric properties of silicon nitride lend themselves to unique applications that include hybrid circuit substrates for microwave electronics, hypersonic interceptor nose cones, and antennas. The photo-curability permits the eventual photolithographic patterning of both carbide and nitride ceramics.