Electronic Interactions Between Metal Ions and Solid Surfaces

这项研究项目由分析和表面化学计划支持，研究了金属离子和固体表面的详细相互作用。过热的铝、硅和镍离子从超高真空中制备和表征的金属和半导体表面散射而来。分别进行了对称(离子和表面相同单元)和非对称(离子和表面不同单元)散射测量。直接测量了入射离子的电荷态分布和非弹性激发几率。加州大学河滨分校的Jory Yarmoff教授和他的合作者Zdenek Sroubek教授将这些离子-表面相互作用的实验研究与分子动力学和电子结构计算结合起来，解释了详细的结果。这些信息对于许多基于离子的分析和处理应用是重要的。金属和半导体离子在金属和半导体表面的散射是本研究项目的重点。从实验和计算两方面考察了入射离子的电荷交换和电子激发。在这些研究中考察了清洁和吸附修饰的表面。这项工作的结果对表面分析和材料加工应用具有重要意义。

This research project, supported by the Analytical and Surface Chemistry Program, examines the detailed interaction of metal ions and solid surfaces. Hyperthermal aluminum, silicon, and nickel ions are scattered from metal and semiconductor surfaces prepared and characterized in ultra-high vacuum. Both symmetric (ion and surface same element) and asymmetric (ion and surface different element) scattering measurements are carried out. Direct measurement of the charge state distribution and the probability for inelastic excitation of the incident ion is accomplished. Professor Jory Yarmoff and his collaborator Professor Zdenek Sroubek at the University of California-Riverside combine experimental studies of these ion-surface interactions with molecular dynamics and electronic structure calculations to interpret the detailed results. This information is important for a number of ion based analytical and process applications.The scattering of metal and semiconductor ions from metal and semiconductor surfaces is the focus of this research project. Charge exchange and electronic excitation of the incident ion is examined, both experimentally and computationally. Clean and adsorbate modified surfaces are examined in these studies. The results of this work are important to surface analytical and materials processing applications.