NER: Combined NIL and ESA Processing of Electro-Optic Materials

摘要NSF提案#0102648电光材料的NIL和ESA联合处理克劳斯，弗吉尼亚理工大学，PI这个NSF NER计划将研究具有增强的电光调制效率和热稳定性的聚合物/电介质纳米复合材料，通过使用弗吉尼亚理工大学的静电自组装（ESA）设施和密歇根大学的纳米压印光刻（NIL）设施的组合。我们将使用NIL来创建基础纳米图案化模板，并使用ESA通过偶极分子的分子水平组装来填充模板。这种方法的组合将允许光学和电光材料和器件的潜在低成本制造。该计划将使我们能够探索涉及纳米图案化，分子排列和结构/性能关系的基本问题，从而产生原型器件材料。

ABSTRACT NSF Proposal #0102648 Combined NIL and ESA Processing of Electro-Optic Materials Richard O. Claus, Virginia Tech, PI This NSF NER program will study polymer/dielectric nanocomposites with enhanced electro-optical modulation efficiency and thermal stability, by using a combination of electrostatic self-assembly (ESA) facilities at Virginia Tech and nanoimprint lithography (NIL) facilities at the University of Michigan. We will use NIL to create a base nanopatterned template and ESA to fill in the template through the molecular-level assembly of dipolar molecules. This combination of approaches would allow the potentially low-cost manufacturing of optical and electro-optic materials and devices. The program will allow us to explore fundamental issues involving nanopatterning, molecular alignment, and structure/property relationships in resulting prototype device materials.