SGER: A Study on Plasma Etching Yield Improvements through a Faculty-in-Industry Internship

摘要：Michael Nikolaou和Brian McMillan研究所：休斯顿大学提议编号：0118516不断增加的功能和晶圆尺寸正在挑战依赖于执行开环配方的集成电路制造实践。为了确保高产，正在逐步使用基于传感器的可靠方法来预防、检测和纠正(控制)异常情况，并需要进一步开发。为此，这个为期四个月的GALI项目将促进微电子行业与休斯顿大学之间的互动，为PI未来在该领域的工作提供重要的投入。这项工作将在LAM Research Corporation的设施中进行，并将重点放在等离子刻蚀方面。两个商业软件产品将被用来确定在预防、检测和纠正(控制)方法的基础上提高产量的潜力，这些方法使用现有工具中的传感器提供的数据。将审查基于软件的方法的局限性，并将为提高等离子体蚀刻产量的传感器、监测和控制系统的短期和长期发展勾勒出有前景的方向。这项工作的继续工作将在他回到他的学术地位后进一步进行。

ABSTRACTPI: Michael Nikolaou and Brian McMillan Institution: University of HoustonProposal Number: 0118516Increasing functionality and wafer sizes are challenging integrated circuit manufacturing practices that rely on the execution of open-loop recipes. To ensure high yields, reliable sensor-based methods for the prevention, detection and correction (control) of abnormal situations are gradually being used and need to be further developed. To that end, this four-month GOALI project will serve to catalyze interaction between the microelectronics industry and the University of Houston, providing important input to the PI's future work in the area.The work will be conducted at Lam Research Corporation's facilities and will focus on plasma etching. Two commercial software products will be used to determine the potential for yield improvements on the basis of prevention, detection, and correction (control) methods that use data provided by sensors in existing tools. The limits of software-based methods will be examined, and promising directions will be outlined for short and long-term development of sensor, monitoring, and control systems for plasma etching yield improvements. Continuation of this work will be further pursued after the PI returns to his academic position.